The ThermoFisher Helios G4 PFIB DualBeam is designed for high-throughput FIB operations. The Xe ion beam is capable of higher beam currents and correspondingly shorter milling times than the Helios Nanolab Ga-beam FIB. This makes it ideal for large area trenching & milling, 3D materials science, and sample preparation.
The Helios PFIB is the newest dual-beam FIB system in the EML, and is equipped with a suite of features to make high-throughput FIB operations easier than ever. A state-of-the-art electron column pairs with a number of detectors to ensure excellent imaging across a range of conditions. Low kV mode operations can be performed with incredible accuracy and ease, unlocking a number of applications for non-conductive and beam sensitive materials. The Xe ion beam removes the possibility of Ga contamination of samples, and allows for smaller damage layers in most materials, while much higher beam currents deliver orders-of-magnitude increases in milling speed.
A new MultiChem gas injection system allows for mixing of gases during depositions, and the EasyLift nanomanipulator offers a straight-forward and integrated solution to lamella and chunk lift-outs. The microscope is equipped with EBSD and EDS systems as well, allowing for rapid collection of 3D datasets. Updated software allows for a new level of process automation, ensuring that users can get maximum data with minimal effort.
Electron Source: Schottky FEG
Ion Source: Xe ion plasma
Detectors (type):
Gas Delivery: MultiChem integrated system
EasyLift nanomanipulator for integrated chunk and lamella lift
NavCam+ for easier sample location/navigation
Vacuum transfer system for processing of samples directly from glovebox environments without exposure to atmosphere
Applications/Software