Method Of Transferring Strained Semiconductor Structures

The transfer of strained semiconductor layers from one substrate to another substrate involves depositing a multilayer structure on a substrate having surface contaminants.

June 25, 2013
Method Of Transferring Strained Semiconductor Structures

The transfer of strained semiconductor layers from one substrate to another substrate involves depositing a multilayer structure on a substrate having surface contaminants.

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Method Of Transferring Strained Semiconductor Structures

The transfer of strained semiconductor layers from one substrate to another substrate involves depositing a multilayer structure on a substrate having surface contaminants. An interface that includes the contaminants is formed in between the deposited layer and the substrate. Hydrogen atoms are introduced into the structure and allowed to diffuse to the interface. Afterward, the deposited multilayer structure is bonded to a second substrate and is separated away at the interface, which results in transferring a multilayer structure from one substrate to the other substrate. The multilayer structure includes at least one strained semiconductor layer and at least one strain-induced seed layer. The strain-induced seed layer can be optionally etched away after the layer transfer.

U.S. Patent No.: 7,638,410 (DOE S-109,115)

Patent Application Filing Date: December 18, 2006

Patent Issue Date: December 29, 2009

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Available for Express Licensing(?). View terms and a sample license agreement.

For more information, contact licensing@lanl.gov.

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