Plasma Processing Research Facility

Facility Description

The Plasma Processing Research Facility (PPRF) is dedicated to developing plasma science and base technologies for a variety of applications including

• advanced materials synthesis,
• advanced environmentally-conscious manufacturing,
• pollution prevention, and
• cleaning and decontamination.

Equipment

The Plasma-Source Ion Implantation Laboratory is the centerpiece of the PPRF. It is used primarily for metallurgical applications and is the world's largest ion beam implanter capable of handling large, heavy workpieces.

The Coaxial Thruster is a 3-foot-diameter coaxial plasma gun used to treat the surfaces of a variety of materials used in manufacturing.

The Anaconda High-Intensity Pulsed Ion Beam Deposition is a 400-keV, 35-kA, 400-ns intense light ion beam, used to synthesize advanced materials (e.g.,thin films such as diamond-like carbon).

Plasma reactors, used to etch surface layers of materials off of a variety of engineered objects.

A plasma immersion ion implantation device dedicated to semiconductor implants, oxide films, and passivation.

A number of unique, patented plasma sources utilizing radio-frequency, and thermionic and electron cyclotron resonance configurations.

Facility Access

Open

Last Update: 25 June 2003

Technical Contact
Louis Rosocha
P-24
Mail Stop: E526
Phone: 505-667-8493
Fax: 505-665-3552
E-mail Address: rosocha@lanl.gov