the idea of developing in situ ion-beam characterization of
ion-beam processing was identified in the early stage (1987) of establishing
the IBML, it has only recently been realized at Los Alamos. An in
situ dual ion-beam facility in the Ion Beam Materials Laboratory
functioning for ion-beam irradiation and in situ ion-beam characterization
since late 1993. In this facility, an analytical beamline from the
3 MV tandem accelerator and an irradiation beamline from the 200 kV
ion implanter (shown at right) are connected at to a common target
chamber, the surface modification chamber. The ion beam characterization,
e.g., Rutherford backscattering spectrometry (RBS) and nuclear reaction
analysis (NRA), in conjunction with ion channeling techniques using
the tandem accelerator, can monitor the in situ changes of
composition and crystallinity of materials being irradiated at temperatures
from -100 to 500 degrees celcius by the ion implanter.
A detailed description of the in situ facility has been published
in Nuclear Instruments and Methods B [1,2]. Mike
Nastasi of the Materials Science and Technology Division is the
 N. Yu, M. Nastasi, T. E. Levine, J. R. Tesmer, M. G. Hollander,
C. R. Evans, and C. J. Maggiore, Nucl.Instru. Meth. B 99, (1995),
 N. Yu, T. E. Levine,
K. E. Sickafus, M. Nastasi, J. N. Mitchell, C. J. Maggiore, C. R.
Evans, M. G. Hollander, J. R. Tesmer, W. J. Weber, and J. W. Mayer,
Nucl. Instru. Meth. B (1995), in press.